影响PLC控制系统的干扰源与一般影响工业控制设备的干扰源一样，大都产生在电流或电压剧烈变化的部位，这些电荷剧烈移动的部位就是噪声源，即干扰源。
干扰类型通常按干扰产生的原因、噪声干扰模式和噪声的波形质的不同划分。其中：按噪声产生的原因不同，分为放电噪声、浪涌噪声、高频振荡噪声等；按噪声的波形、质不同，分为持续噪声、偶发噪声等；按噪声干扰模式不同，分为共模干扰和差模干扰。共模干扰和差模干扰是一种比较常用的分类方法。共模干扰是信号对地的电位差，主要由电网串入、地电位差及空间电磁辐射在信号线上感应的共态（同方向）电压迭加所形成。共模电压有时较大，特别是采用隔离能差的配电器供电室，变送器输出信号的共模电压普遍较高，有的可高达130V以上。共模电压通过不对称电路可转换成差模电压，直接影响测控信号，造成元器件损坏（这就是一些系统I/O模件损坏率较高的主要原因），这种共模干扰可为直流、亦可为交流。差模干扰是指作用于信号两极间的干扰电压，主要由空间电磁场在信号间耦合感应及由不平衡电路转换共模干扰所形成的电压，这种直接叠加在信号上，直接影响测量与控制精度。
2 PLC控制系统中电磁干扰的主要来源
2.1来自空间的辐射干扰
空间的辐射电磁场（EMI）主要是由电力网络、电气设备的暂态过程、雷电、无线电广播、电视、雷达、高频感应加热设备等产生的，通常称为辐射干扰，其分布极为复杂。若PLC系统置于所射频场内，就回收到辐射干扰，其影响主要通过两条路径：一是直接对PLC内部的辐射，由电路感应产生干扰；而是对PLC通信内网络的辐射，由通信线路的感应引入干扰。辐射干扰与现场设备布置及设备所产生的电磁场大小，特别是频率有关，一般通过设置屏蔽电缆和PLC局部屏蔽及高压泄放元件进行保护。
2.2来自系统外引线的干扰
主要通过电源和信号线引入，通常称为传导干扰。这种干扰在我国工业现场较严重。
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